Ultratech/CNT is the leading provider of atomic layer deposition (ALD) systems for research and industry worldwide, delivering comprehensive services and versatile, turnkey systems that are accessible, affordable and accurate to the atomic scale. Thin film deposition is our expertise. Our Savannah Series of thin film deposition tools exemplifies these competencies.
Savannah has become the preferred system for university researchers worldwide engaged in ALD and looking for an affordable yet robust platform. We have delivered hundreds of these systems in the past decade. Savannah’s efficient use of precursors and power-saving features substantially reduces the cost of operating a thin film deposition system.
Savannah is equipped with high-speed pneumatic pulse valves to enable our unique Exposure Mode™ for thin film deposition on Ultra High Aspect Ratio substrates. This proven precision thin film coating methodology can be used to deposit conformal, uniform films on substrates with aspect ratios of greater than > 2000:1. Savannah is available in three configurations: S100, S200, and S300. Savannah is capable of holding substrates of different sizes (up to 300mm for the S300). The Savannah thin film deposition systems are equipped with heated precursors lines and the option to add up to six lines. Savannah is capable of handling gas, liquid, or solid precursors.
|Substrate Size||Savannah S100: up to 100 mm
Savannah S200: up to 200 mm
Savannah S300: up to 300 mm
|Dimensions (w x d x h)||Savannah S100: 585 x 560 x 980 mm
Savannah S200: 585 x 560 x 980 mm
Savannah S300: 686 x 560 x 980 mm
|Cabinet||Steel with white powder coat paint with removable panels and lockable precursor door|
|Operational Modes||Continuous Mode™ (high speed) or Exposure Mode™ (ultra-high aspect ratio)|
|Power||115 VAC or 220 VAC,1500 W (excluding pump)|
|Controls||LabVIEW™, Windows™ 7, Lenovo Laptop, USB control|
|Maximum Substrate Temperature||S100: RT - 400 °C
S200: RT - 350 °C
S300: RT - 350 °C
|Deposition Uniformity||(Al2O3) <1% (1σ)|
|Cycle Time||<2 seconds per cycle with Al2O3 at 200 °C|
|Vacuum Pump||Alcatel 2021C2 – 14.6 CFM|
|Compatibility||Clean room class 100 compatible|
|Compliance||CE, TUV, FCC|
|Precursor Delivery System, Ports||2 lines standard, up to 6 lines available
Each line accommodates solid, liquid and gas precursors
Lines can be independently heated up to 200 °C
|Precursor Delivery System, Valves||Industry standard high speed ALD valves with 10 msec response time|
|Precursor Cylinders||Individually heated 50 ml stainless steel cylinders, optional larger cylinders available|
|Carrier/Venting Gas||N2 mass flow controlled, 100 SCCM|
|Options||Low Vapor Pressure Delivery (LVPD) System
Dome lid for wafer cassette or 3D objects
Glove box Interface
In-Situ Quartz Crystal MicroBalance (QCM)
Self Assembling Monolayers (SAMs)
Quotation process and financing, as well as product support and maintenance.