ALD for Production

Phoenix Atomic Layer Deposition System

Uniformity over large substrates, reproducibility, and low temperature deposition make ALD an ideal candidate for the next generation of large-scale manufacturing thin film technology.

Veeco/CambridgeNanoTech has perfected ALD as a maufacturing-grade technology by scaling up the process and implementing it into automation lines and cluster tools around the world. Manufacturers that have integrated our ALD systems have seen increased product quality and reliability as well as decreased operating costs and a greener footprint as compared to previous coating technologies.

Batch ALD Tool: Phoenix

If you have production ALD needs, then our Phoenix production ALD system is the right choice. Phoenix is a batch ALD tool capable of holding a large number of substrates at one time. Its unique chamber design assures accurate films from batch to batch.