Veeco/CNT ALD Research

ALD Applications

The Veeco CNT Science team is involved in many fields of leading-edge ALD and SAMS research. While all our work can not necessarily be shared, below is a list of references published by our team.

2016

  • Bertuch, A., Keller, B. D., Ferralis, N., Grossman, J. C. & Sundaram, G. “Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum.” Journal Of Vacuum Science & Technology A-Vacuum Surfaces And Films 35, 01B141 (2016).
  • Sowa, M. J. et al. “Plasma-enhanced atomic layer deposition of superconducting niobium nitride.” Journal Of Vacuum Science & Technology A-Vacuum Surfaces And Films 35, 01B143 (2016).
  • Sowa, M. J., Yemane, Y., Prinz, F. B. & Provine, J. “Plasma-enhanced atomic layer deposition of tungsten nitride.” Journal Of Vacuum Science & Technology A-Vacuum Surfaces And Films 34, 051516 (2016).
  • L. Lecordier, S. Armini, “Novel method to achieve area selective ALD on copper metal vs. SiO2 using vapor-phase deposited SAMS”, 16th Intern. ALD conference, 2016, Dublin –
  • A. Bertuch, B. Keller, N. Ferralis, J.C. Grossman, G. Sundaram,  “Plasma enhanced atomic layer deposition of molybdenum nitride”, 16th Intern. ALD conference, 2016, Dublin –
  • R. Bhatia, “Controlling smoothness of thin Pt ALD films”, 16th Intern. ALD conference, 2016, Dublin –
  • M. Sowa, “Plasma enhance atomic layer deposition of superconducting NbN films”, 16th Intern. ALD conference, 2016, Dublin –
  • B. Keller, A. Bertuch, F. Pinna, N. Ferralis, J. Provine, G. Sundara2, and J. Grossman, “Two-Dimensional Molybdenum Disulfide from ALD Molybdenum Oxide”, 2016 MRS Spring Meeting, Phoenix

2015

  • B. Keller, A. Bertuch, N. Ferralis, J. Provine, J.C. Grossman, and G. Sundaram, “Growth, Characterization, and Application of Two-Dimensional Molybdenum Disulfide”, 15th Intern. ALD conference, 2015, Portland, OR
  • S. Warnat, C. Forbrigger, T. Hubbard, A. Bertuch, and G. Sundaram, “Thermal MEMS actuator operation in aqueous media/seawater: Performance enhancement through atomic layer deposition post processing of PolyMUMPs devices”,  J. Vac. Sci. Technol. A 33, 01A126 (2015)
  • L. Lecordier, Atomic layer deposition and in-situ characterization of Y2O3 and Yttria stabilized Zirconia, 228th ECS conference proceedings, 2015, Phoenix AZ
  • Sowa, M. J., Plasma Enhanced Atomic Layer Deposition of Tungsten Nitride, 15th Intern. ALD conference, 2015, Portland, OR
  • C. Waldfried, W. Neff, I.-K. Lin, and R. Bhatia, “Thermal Stability of Thick ALD Al2O3 Films, 15th Intern. ALD conference, 2015, Portland, OR
  • Jonathan McBee, “Computer Science for the G Programmer: The Dependency Inversion Principle”, LabView Craftsmanship Conference, Boston, MA, 2015

2014

  • A. Bertuch, G. Sundaram, M. Saly, D. Mosher, and R. Kanjolia, “Atomic Layer Deposition of Molybdenum Oxide using bis(tert-butylimido)bis(dimethylamido) molybdenum”, J. Vac. Sci. Technol A, Vol.32, Issue 1. 2014
  • Lecordier L., et al,  In-situ based process optimization of Lithium-based multicomponent oxides, in 14th Intern. ALD conference, 2014, Kyoto, Japan
  • Sowa, M. J., Role of plasma enhanced atomic layer deposition reactor wall conditions on radical and ion substrate fluxes, J. Vac. Sci. Technol, A 32, 01A106 (2014), http://dx.doi.org/10.1116/1.4831896
  • G. Sundaram., L. Lecordier, “In-situ process optimization of multinary ALD films”, Belux Workshop, 2014 Belvaux, (Luxumbourg)

2013

  • G. Sundaram *“Atomic Layer Deposition and Self-Assembled Molecules”, Annual IAP Meeting, Georgia Institute of Technology, Atlanta, GA, 2013
  • Webinar: M. Sowa “How to Expand Your Research Capability with Atomic Layer Deposition”, May 2013.
  • R. Bhatia, J. Provine, G. Liu “Effect of Oxidant and Deposition Temperature on ALD Iron Oxide ”, 13th Intern. ALD conference, 2013, San Diego, CA
  • M. Sowa,Role Of PEALD Reactor Wall Conditions On Radical And Ion Substrate Fluxes ”, 13th Intern. ALD conference, 2013, San Diego, CA
  • A. Bertuch, G. Sundaram, M. Saly, D. Moser, R. Kanjolia “Atomic Layer Deposition of Molybdenum Oxide using bis(tert-butylimido)bis(dimethylamido) molybdenum ”13th Intern. ALD conference, 2013, San Diego, CA
  • G. Sundaram, *“The Use of Atomic Layer Deposition in Energy Related Applications ”, 60th International American Vacuum Society Symposium, Long Beach, CA, 2013
  • G. Sundaram, L. Lecordier. R. Bhatia, *“Vapor Phase Surface Functionalization using Atomic Layer Deposition (ALD) and Self Assembled Monolayers (SAMs) ”, International Meeting of the Electrochemical Society, San Francisco, CA, 2013

2012

  • G.M. Sundaram, L. Lecordier, M. Sershen, M.J. Dalberth, M. Ruffo, S. Magner. R. Bhatia, R. Coutu, and J.S. Becker “Industrialization of Atomic Layer Deposition (ALD): A Path for R2R Applications”, Flextech International Conference, Phoenix AZ, 2012
  • L. Lecordier, M. Dalberth, M. Sershen, M. Ruffo, R. Coutu, G. Sundaram, and J. Becker “Design Iterations and Process Optimization of a Spatial ALD System, for High Throughput Roll-to-Roll Applications”, 12th Intern. ALD conference, 2012, Dresden, Germany
  • Guo Liu, Eric W. Deguns, Ganesh Sundaram, and Jill S. BeckerConformal Fe, Co, and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition, Guo Liu, Eric W. Deguns, Ganesh Sundaram, and Jill S. Becker, 12th Intern. ALD conference, 2012, Dresden, Germany
  • Ritwik Bhatia, Laurent Lecordier, and Ganesh Sundaram“In-Situ Monitoring of ALD Film Growth for Evaluation of Self Assembled Monolayers”,12th Intern. ALD conference, 2012, Dresden, Germany
  • L. Lecordier, R. Bhatia, M. Dalberth, G. Sundaram, and J. Becker “In-Situ QCM, and Spectroscopic Ellipsometry During Thermal, and Plasma ALD Processing, 12th Intern. ALD conference, 2012, Dresden, Germany
  • R. Bhatia, “Atomic Layer Deposition of Metal Oxides for TFT Devices”SEMICON West , San Francisco, CA, 2012
  • L. Lecordier, *“Principles and Applications of Atomic Layer Deposition and Self Assembled Monolayers”, SPIE Nanotechnology Symposium, San Diego, CA, 2012
  • L. Lecordier, “Self Assembled Monolayers”, International Micro and Nano Engineering Conference, Toulouse, France, 2012
  • M. Sowa , “Role of PEALD reactor wall conditions on radical and ion substrate fluxes”, 59th International American Vacuum Society Symposium, Tampa, FL, 2012
  • L. Lecordier, “Advances in roll-to-roll ALD Processing”, 59th International American Vacuum Society Symposium, Tampa, FL, 2012

2011

  • G.M. Sundaram et.al *”Fast Atomic Layer Deposition System for Flexible and Rigid Substrates”, Flextech International Conference, Phoenix AZ, 2012
  • L. Lecordier et.al  “From High Aspect Ratio Nanoscale to Roll-To-Roll Coating  Review of Atomic Layer Deposition Principles and Emerging Applications”, L. Lecordier et.al, AVS New England Meeting, Boston, MA, 2011
  • A. O’Mahony et al “Structural and Electrical Characterisation of High-k Gate Oxide Structures Deposited by Atomic Layer Deposition”, International Conference of the Israel Vacuum Society, Te-Aviv, Israel, 2011
  • M. Dalberth et al, “Roll to Roll ALD: From prototype to manufacturing”, 11th Intern. ALD conference, 2011, Cambridge, MA
  • L. Lecordier et al “Rapid vapor phase surface functionalization with hybrid SAMs / ALD heterostructures”, 11th Intern. ALD conference, 2011, Cambridge, MA
  • G.Liu et al,  “High Rate Growth of SiO2 by Thermal ALD Using Tris(di-methylamino)silane and Ozone”, 11th Intern. ALD conference, 2011, Cambridge, MA
  • G.M.Sundaram et.al *”Industrial ALD Systems: The Role of Computation in Design”, 11th Intern. ALD conference, 2011, Cambridge, MA
  • “Making Films One Layer at a Time” C&EN, 2011
  • G.M. Sundaram et.al *”Industrialization of Atomic Layer Deposition: An approach to high speed depositions”, EuroCVD, Kinsale, Ireland, 2011
  • G.M. Sundaram et.al, *”Advances in FAST ALD Processes for R2R Applications”, Flextech Nanomaterials Workshop, Atlanta, GA, 2011
  • G. Liu et al, “Atomic Layer Deposition of AlN with Tris(Dimethylamido)aluminum and NH3”, International Meeting of the Electrochemical Society, Boston, MA, 2011
  • G.M. Sundaram et. al *”Advances in ALD Methods for Roll-to-Roll (R2R) Applications”, National Nanomanufacturing Network Workshop, Boston, MA, 2011
  • G.M. Sundaram et. al *”Industrialization of Atomic Layer Deposition: From Design to Deposition”, 58th International American Vacuum Society Symposium, Nashville, TN, 2011
  • M.J. Sowa et al, “Flexibility and Water Vapor Transmission Rates for Al-, Hf-, and Zr-based ALD films and Nanolaminates Utilizing Water and Glycerol Co-reactants”, 58th International American Vacuum Society Symposium, Nashville, TN, 2011

2010

  • G. Liu, A. Bertuch, M. Sowa, Ritwik Bhatia, E. Deguns, M. Dalberth, G. Sundaram, and Jill S. Becker,  “Precursor Boost for Low Vapor Pressure ALD Precursors”, 10th Intern. ALD conference, 2010, Seoul, Korea
  • Sowa, M. J., et al, “Role of process conditions for low-resistivity TiN via plasma enhanced ALD”, 10th Intern. ALD conference, 2010, Seoul, Korea
  • G. Sundaram, A. BertuchR. BhatiaR. Coutu, and M. DalberthE. DegunsG. LiuM. Sowa, and J. Becker,  “Large Format Atomic Layer Deposition”, 218th ECS Meeting, Atomic Layer Deposition Applications  Volume 33, Issue 2, Las Vegas, NV, October 10-15, 2010
  • Brodie, A., et al., “Fabrication of Coatings with Targeted Tunable Electrical Properties via ALD: Al2O3/ZnO Ta2O5/Nb2O5”, in ECS Transactions. 2010, ECS. p. 101-110
  • M. DalberthM. SowaE. DegunsR. BhatiaA. BertuchG. LiuG. Sundaram, and J. Becker, “Properties of Hafnium Oxide Deposited with Ozone or Oxygen Plasma”, 218th ECS Meeting, Atomic Layer Deposition Applications,  October 10-15, 2010
  • Co-authored paper with KLA
  • M. Sowa, G. Sundaram, E. Deguns, R. Bhatia, M. Dalberth, A. Bertuch, G. Liu, and J. Becker “Role of PEALD System Plasma Source Operation on Substrate Ion Bombardment and the Impact on HfO2 and TiN Film Properties”,  57th International American Vacuum Society Symposium, Albuquerque, NM, 2010
  • Deguns, E.W., "ALD Thin Films for Flexible Electronics: An Application Primer". FlexTech Trends: News From the World for Displays and Flexible, Printed Electronics, 2010. 6: p. 7 - 11.
  • Deguns, E.W., et al., "A Stable Organometallic Precursor for Nb2O5" in Baltic ALD 2010 & GerALD 2. 2010: Hamburg, Germany
  • Deguns, E.W., et al., Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor, in ECS Transactions. 2010, ECS. p. 177-182
  • Sowa, M.J., et al., "Pushing the ALD Envelope". Ceramic Industry, 2010. 160(5): p. 20.
  • Baxter, J., "Cambridge NanoTech Solves ALD Valve Problem: A Case Study”. Gases & Instrumentation, 2010. 4(4).

2009

  • Sowa, M. J., et al, “Remote plasma source performance and its impact on film deposition rates and properties in a new, commercial ALD system”, 9th Intern. ALD conference, 2009, Monterey CA
  • Bhatia, R., et al., "Electrical and optical properties of metal doped zinc oxide" 9th International Conference on Atomic Layer Deposition. 2009: Monterey, CA 
  • Dalberth, M.J., et al. "GaN nanowire resonators used as testbed for ALD film mechanical and deposition properties", 9th International Conference on Atomic Layer Deposition. 2009. Monterey, CA
  • Sundaram, G.M., et al., "Thin Films for 3D: ALD for non-planar topographies". Solid State Technology, 2009.
  • Ritwik Bhatia, Mark Dalberth, Ganesh Sundaram and Jill Becker, “Thickness and Composition Effects on the Electrical Conductivity of Doped ALD Zinc Oxide”, MRS Spring Symposium V 9.3 April 16, 2009,  San Francisco, CA

2008

  • G.M Sundaram, D.J. Monsma, and J.S. Becker, “*Leading Edge Atomic Layer Deposition Applications”, ECS Transactions 16 (4) 19-27, 2008
  • Daniel, J.H., et al., The interplay of materials in printed electronics", in Materials Research Society Symposium Proceedings. 2008

2007

  • D.J. Monsma, and J.S. Becker, *”Savannah ALD Systems: Enabling Quick Results”, ECS Transactions, Volume 11, issue 7, 2007

* Invited